Model：CMP60、CMP70、CMP80、CMP90、CMP130、CMP160 etc..
| 【Description】 |
Use of nanoscale abrasive particles and a special substrate preparation, a unique |
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complex that tiny particles, low abrasive content of suspended excellent, high |
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purity, fine grain size, no special cleaning process |
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| 【Feature】 |
Base on Process requirement, abrasives will be used differently (Colloidal Silica, |
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Polycrystalline alumina, or Cerium Oxide), and with each particular structure can |
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effectively control the polishing temperature |
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High removal rate, surface roughness excellent, achieve excellent finished surface |
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Easy to clean, non-crystalline residue |
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| 【Keyword】 |
CMP拋光液 / CMP Slurry |
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LED Process
Substrate Process
LED Equipment
Substrate Equipment
Consumables
