LED Process Substrate Process LED Equipment Substrate Equipment Consumables

CMP Slurry back
Model:CMP60、CMP70、CMP80、CMP90、CMP130、CMP160 etc..

【Description】 Use of nanoscale abrasive particles and a special substrate preparation, a unique
  complex that tiny particles, low abrasive content of suspended excellent, high
  purity, fine grain size, no special cleaning process
   
【Feature】 Base on Process requirement, abrasives will be used differently (Colloidal Silica,
  Polycrystalline alumina, or Cerium Oxide), and with each particular structure can
  effectively control the polishing temperature
  High removal rate, surface roughness excellent, achieve excellent finished surface
  Easy to clean, non-crystalline residue
   
【Keyword】 CMP拋光液 / CMP Slurry

 

Specification: